Quantum dot qubit using High NA EUV lithography
Imec has unveiled a quantum dot qubit device created using High NA EUV lithography, marking a significant advancement in quantum computing technology. This development aims to enhance the reliability and scalability of qubits, which are essential for quantum computers. The integration of this technology could lead to the production of millions of qubits on a single chip, facilitating the transition from laboratory experiments to large-scale manufacturing.
- ▪Imec presented the first quantum dot qubit device fabricated using High NA EUV lithography at ITF World.
- ▪Silicon quantum dot spin qubits are seen as promising candidates for industrial scaling due to their compatibility with standard computer chip production.
- ▪The successful fabrication of qubits with gaps of only 6 nanometers allows for the theoretical integration of millions of quantum bits on a single chip.
Opening excerpt (first ~120 words) tap to expand
LEUVEN (Belgium), MAY 19, 2026— This week, at ITF World, imec, a world-leading research and innovation hub in advanced semiconductor technologies, presents a world first: a quantum dot qubit device fabricated using High NA EUV lithography. This achievement marks a milestone toward the industrial scaling of more reliable qubits, the basic computational units of quantum computers. To the best of our knowledge, this is the first integrated hardware device created using High NA EUV lithography. For specific, complex computational problems, such as developing new drugs or simulating physical processes, a quantum computer could perform exponentially better than classical computers.
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Excerpt limited to ~120 words for fair-use compliance. The full article is at imec.