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Using Azo Photoisomerization to Alter Semiconductor Film Properties

Using Azo Photoisomerization to Alter Semiconductor Film Properties

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Researchers have demonstrated that azobenzene compounds can optically alter the properties of semiconductor films when exposed to UV light. This technique allows for dynamic changes in carrier densities within transition metal dichalcogenide monolayers, effectively modifying the behavior of field-effect transistors. The proof-of-concept study suggests potential applications in developing programmable circuits and sensors that respond to external stimuli.

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Original publisherHackaday
Canonical URLhttps://hackaday.com/2026/09/19/using-azo-photoisomerization-to-alter-semiconductor-film-properties/
Publication timeSat, 19 Sep 2026 11:00:40 +0000
Retrieval time2026-09-19T11:03:47.102Z
Last seen2026-09-19T11:03:47.102Z
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Basis: Derived from the published RSS/Atom feed. Contact: [email protected]. Reviewed: 2026-07-24.

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Using Azo Photoisomerization To Alter Semiconductor Film Properties No comments by: Maya Posch September 19, 2026 Title: Copy Short Link: Copy Generally semiconductor devices like transistors have fixed properties, but using an azobenzene (Azo) compound it’s possible to optically alter these properties by exposing them to UV light. This is demonstrated in a recent paper by [Jaehoon Ji] et al., as published in Science Advances, with accompanying coverage by Princeton University. Building on previous research on e.g. flakes of MoS2 with photochromic Azo molecules, a functional semiconductor device was created. This uses a transition metal dichalcogenide (TMD) monolayer combined with the Azo compound, with the latter altering the electrical and optical properties of the structure.

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